Skip to Main content Skip to Navigation
Journal articles

Influence of high numerical aperture on depth-of-field enhancing phase mask optimization in localization microscopy

Abstract : The depth-of-field (DoF) of localization microscopes can be extended by placing a phase mask in the aperture stop of the objective. To optimize these masks and characterize their performance, defocus is in general modeled by a simple quadratic pupil phase term. However, this model does not take into account two essential characteristics of localization microscopy setups: an extremely high numerical aperture (NA) and a mismatch between the refractive indices of the immersion liquid and sample. Using the more realistic high NA image formation model of Gibson & Lanni (GL), we show that the DoF extension is simply reduced by a NA-dependent scaling factor. We also show that, provided this scaled DoF extension factor is taken into account, masks optimized with the approximate quadratic model are still nearly optimal in the framework of the GL model. This result is important since it establishes that generic optimized masks can be used in setups with different NA and immersion indices.
Complete list of metadata

https://hal.archives-ouvertes.fr/hal-03331525
Contributor : Olivier Lévêque Connect in order to contact the contributor
Submitted on : Wednesday, September 1, 2021 - 6:49:23 PM
Last modification on : Friday, October 8, 2021 - 3:37:13 AM

File

JOSA_A_432696.pdf
Files produced by the author(s)

Identifiers

Citation

Olivier Lévêque, Romain Duverger, Hervé Sauer, Caroline Kulcsár, François Goudail. Influence of high numerical aperture on depth-of-field enhancing phase mask optimization in localization microscopy. Journal of the Optical Society of America. A Optics, Image Science, and Vision, Optical Society of America, 2021, 38 (9), pp.1380-1390. ⟨10.1364/JOSAA.432696⟩. ⟨hal-03331525⟩

Share

Metrics

Record views

25

Files downloads

52