Influence of microstructure on electrical properties of SnO2 films prepared by CVD.

Abstract : The microstructure of tin dioxide thin films have a great influence on the electrical performances of SnO2 gas sensors. An O.M.C.V.d. technic is used to prepare materials with suitable textures by changing the deposition parameters. A detailed characterization of the films is presented including X-ray, S.E.M. and ESCA measurements. Special attention is given to the thickness and the grain size determinations. The influence of annealing on the textural and electrical properties is also investigated. Electrical measurements show the conductivity dependency under pure air with the tickness and the deposition temperature. A part of the results are explained by taking into account the variations of the texture (thickness, grain packing) and the stoichiometry of the films.
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Article dans une revue
Advanced in Inorganic Films and Coatings, 1995, pp.497-504
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https://hal-emse.ccsd.cnrs.fr/emse-00435852
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Soumis le : mercredi 25 novembre 2009 - 09:25:06
Dernière modification le : mercredi 29 novembre 2017 - 10:07:20

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  • HAL Id : emse-00435852, version 1

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Laurent Bruno, René Lalauze, Christophe Pijolat. Influence of microstructure on electrical properties of SnO2 films prepared by CVD.. Advanced in Inorganic Films and Coatings, 1995, pp.497-504. 〈emse-00435852〉

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