Virtual metrology models for predicting overlay of photolithography process - Mines Saint-Étienne
Conference Papers Year : 2010

Virtual metrology models for predicting overlay of photolithography process

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https://hal-emse.ccsd.cnrs.fr/emse-00470438

Submitted on : Tuesday, April 6, 2010-3:25:04 PM

Last modification on : Tuesday, September 17, 2024-3:45:15 PM

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emse-00470438 , version 1 (06-04-2010)

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  • HAL Id : emse-00470438 , version 1

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Ariane Ferreira, Christelle Kernaflen, Yacine Oussar, Laurent Bucelle, Quentin Mathian, et al.. Virtual metrology models for predicting overlay of photolithography process. 10th European Advanced Equipment Control/ Advanced Process Control (AEC/APC) Conference, Apr 2010, Catania, Italy. ⟨emse-00470438⟩

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