Femtosecond pulsed laser ablation has been used for the deposition of various thin films by co-ablating pure graphite and pure metallic targets (nickel or tantalum) under vacuum conditions with an amplified Ti:sapphire laser working at 800 nm, with about 1.5 mJ per pulse at a repetition rate of 1 kHz. The plasma plume created during the femtosecond pulsed laser deposition process has been investigated, by fast imaging and spectroscopic characterizations, depending on the ablated target and deposition conditions. Particular attention has been paid to the correlation between the film nanostructure and the plasma plume properties, in terms of ejected species and energies of impinging species on the substrate. The tantalum clusters in the tantalum-doped carbon films appear under two crystalline phases: a stable phase (alpha-Ta) corresponding to that of the target, and a metastable phase (beta-Ta), already observed at high temperatures. The presence of this metastable phase (beta-Ta) is correlated to the temperature of the clusters measured from the plasma plume investigation.