Silicon Thin-Films from Nanoparticle dispersion: Tailoring Morphological, Electrical and Optical Characteristics

Abstract : Amorphous and microcrystalline silicon are currently used for electronic devices such as solar cells and thin-film transistors. This paper shows that silicon nanoparticle dispersion has the potential to be used as source material for polycrystalline silicon thin-film thus opening a route to solution processed silicon devices. After deposition, a classical thermal or microwave annealing step is used to induce the coalescence of the silicon nanoparticles. Both sintering techniques are studied in terms of morphology, electrical and optical properties.
Type de document :
Communication dans un congrès
B. Yan, S. Higashi, C.C. Tsai, Q. Wang, H. Gleskova. Materials Research Society Spring Meeting 2011, Apr 2011, San Francisco, France. 1321, pp.mrss11-1321-a12-03, 2011, 〈10.1557/opl.2011.1096〉
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https://hal-emse.ccsd.cnrs.fr/emse-00640906
Contributeur : Etienne Drahi <>
Soumis le : lundi 14 novembre 2011 - 14:19:08
Dernière modification le : mercredi 29 novembre 2017 - 10:06:25

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Etienne Drahi, Sylvain Blayac, Patrick Benaben. Silicon Thin-Films from Nanoparticle dispersion: Tailoring Morphological, Electrical and Optical Characteristics. B. Yan, S. Higashi, C.C. Tsai, Q. Wang, H. Gleskova. Materials Research Society Spring Meeting 2011, Apr 2011, San Francisco, France. 1321, pp.mrss11-1321-a12-03, 2011, 〈10.1557/opl.2011.1096〉. 〈emse-00640906〉

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