Substrate Depletion Analysis and Modeling of the High Temperature Oxidation of Binary Alloys

Abstract : To predict concentration changes in binary alloy due to preferential oxidation during high temperature oxidation, a model based on the flux balance of the oxidized element at the moving oxide/alloy interface has been developed. These changes are driven by the alloy oxidation rate k (c) . The model is numerically solved considering different initial alloy concentration profiles and a possible diffusion enhancement effect close to the alloy surface. After validating the model by comparison with Wagner's analytical solution for Ni-30wt%-Pt alloy oxidised at 850 A degrees C, we show that the effects of an initial alloy depletion due to the presence of a passive oxide layer are cancelled after very short oxidation times. We also show that a diffusion acceleration due to work-hardening in the vicinity of the alloy surface induces an inflexion point in the depletion profile.
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Oxidation of Metals, Springer Verlag, 2013, 79 (Issue : 1-2 : Special Issue : SI), pp.81-91. 〈10.1007/s11085-012-9353-z〉
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Contributeur : Géraldine Fournier-Moulin <>
Soumis le : lundi 10 mars 2014 - 17:09:00
Dernière modification le : jeudi 11 janvier 2018 - 06:15:39

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Etienne Marrier, Patrick Ganster, Nicolas Moulin, Krzysztof Wolski. Substrate Depletion Analysis and Modeling of the High Temperature Oxidation of Binary Alloys. Oxidation of Metals, Springer Verlag, 2013, 79 (Issue : 1-2 : Special Issue : SI), pp.81-91. 〈10.1007/s11085-012-9353-z〉. 〈emse-00957647〉

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