Characterization and TCAD Simulation of 90nm Technology PMOS Transistor Under Continuous Photoelectric Laser Stimulation for Failure Analysis Improvement
Résumé
This study responds to our need to optimize failure analysis methodologies based on laser/silicon interactions, using the functional response of an integrated circuit to local laser stimulation. Thus it is mandatory to understand the behavior of elementary devices under laser stimulation, in order to model and anticipate the behavior of more complex circuits. This paper characterizes and analyses effects induced by a static photoelectric laser on a 90 nm technology PMOS transistor. Comparisons between currents induced in short or long channel transistors for both ON and OFF states are made. Experimental measurements are correlated to Finite Elements Modeling Technology Computer Aided Design (TCAD) analyses. These physical simulations give a physical insight of carriers generation and charge transport phenomena in the devices.
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HAL_ISTFA_2012_Characterization_and_TCAD_Simulation_of_90nm_Technology_PMOS_Transistor_Under_Continuous_Photoelectric_Laser_Stimulation_for_Failure_Analysis_Improvement.pdf (450.7 Ko)
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