Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing - Mines Saint-Étienne
Conference Papers Year : 2015

Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing

Domains

Operations Research [math.OC]

Stéphane Dauzère-Pérès  : Connect in order to contact the contributor

https://hal-emse.ccsd.cnrs.fr/emse-01792282

Submitted on : Tuesday, May 15, 2018-12:56:43 PM

Last modification on : Tuesday, September 17, 2024-3:45:56 PM

No file

Dates and versions

emse-01792282 , version 1 (15-05-2018)

Identifiers

Cite

Alejandro Sendon, Stéphane Dauzère-Pérès, Jacques Pinaton. Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing. 2015 Winter Simulation Conference (WSC), Dec 2015, Huntington Beach, United States. ⟨10.1109/WSC.2015.7408397⟩. ⟨emse-01792282⟩

Export

BibTeX XML-TEI Dublin Core DC Terms EndNote DataCite

Collections

EMSE PRES_CLERMONT CNRS SFL-ENSMSE LIMOS TDS-MACS CLERMONT-AUVERGNE-INP INSTITUT-MINES-TELECOM
43 View
0 Download

Altmetric

Share

More