Virtual metrology models for predicting overlay of photolithography process - Mines Saint-Étienne Access content directly
Conference Papers Year : 2010
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emse-00470438 , version 1 (06-04-2010)

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  • HAL Id : emse-00470438 , version 1

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Ariane Ferreira, Christelle Kernaflen, Yacine Oussar, Laurent Bucelle, Quentin Mathian, et al.. Virtual metrology models for predicting overlay of photolithography process. 10th European Advanced Equipment Control/ Advanced Process Control (AEC/APC) Conference, Apr 2010, Catania, Italy. ⟨emse-00470438⟩
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