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Virtual metrology models for predicting overlay of photolithography process

Ariane Ferreira 1 Christelle Kernaflen 1 Yacine Oussar 2 Laurent Bucelle 3 Quentin Mathian 3 Stéphane Decorme 3
2 SIGMA - Laboratoire Signaux, Modèles et Apprentissage Statistique
ESPCI Paris - Ecole Superieure de Physique et de Chimie Industrielles de la Ville de Paris, CNRS - Centre National de la Recherche Scientifique : UMR7084
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Conference papers
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https://hal-emse.ccsd.cnrs.fr/emse-00470438
Contributor : Sabine Salmeron <>
Submitted on : Tuesday, April 6, 2010 - 3:25:04 PM
Last modification on : Saturday, April 24, 2021 - 6:40:04 PM

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  • HAL Id : emse-00470438, version 1

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Ariane Ferreira, Christelle Kernaflen, Yacine Oussar, Laurent Bucelle, Quentin Mathian, et al.. Virtual metrology models for predicting overlay of photolithography process. 10th European Advanced Equipment Control/ Advanced Process Control (AEC/APC) Conference, Apr 2010, Catania, Italy. ⟨emse-00470438⟩

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