Virtual metrology models for predicting overlay of photolithography process

Type de document :
Communication dans un congrès
10th European Advanced Equipment Control/ Advanced Process Control (AEC/APC) Conference, Apr 2010, Catania, Italy
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https://hal-emse.ccsd.cnrs.fr/emse-00470438
Contributeur : Sabine Salmeron <>
Soumis le : mardi 6 avril 2010 - 15:25:04
Dernière modification le : jeudi 11 janvier 2018 - 06:23:18

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  • HAL Id : emse-00470438, version 1

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Ariane Ferreira, Christelle Kernaflen, Yacine Oussar, Laurent Bucelle, Quentin Mathian, et al.. Virtual metrology models for predicting overlay of photolithography process. 10th European Advanced Equipment Control/ Advanced Process Control (AEC/APC) Conference, Apr 2010, Catania, Italy. 〈emse-00470438〉

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