FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography

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https://hal-emse.ccsd.cnrs.fr/emse-00470515
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Submitted on : Tuesday, April 6, 2010 - 5:24:14 PM
Last modification on : Tuesday, October 23, 2018 - 2:36:10 PM

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  • HAL Id : emse-00470515, version 1

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Quentin Mathian, Christelle Kernaflen, Ariane Ferreira, Laurent Bucelle. FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography. 11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France. ⟨emse-00470515⟩

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