FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography

Quentin Mathian 1 Christelle Kernaflen 2 Ariane Ferreira 2 Laurent Bucelle 1
1 ST-ROUSSET - STMicroelectronics [Rousset]
2 SFL-ENSMSE - Département Sciences de la Fabrication et Logistique
Document type :
Conference papers
Complete list of metadatas
https://hal-emse.ccsd.cnrs.fr/emse-00470515
Contributor : Sabine Salmeron <>
Submitted on : Tuesday, April 6, 2010 - 5:24:14 PM
Last modification on : Tuesday, October 23, 2018 - 2:36:10 PM

Identifiers

  • HAL Id : emse-00470515, version 1

Collections

CMP-ENSMSE | EMSE | SFL-ENSMSE | INSTITUT-TELECOM

Citation

Quentin Mathian, Christelle Kernaflen, Ariane Ferreira, Laurent Bucelle. FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography. 11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France. ⟨emse-00470515⟩

Export

BibTeX TEI DC DCterms EndNote

Share

Metrics

Record views

86

Contact

support.ccsd.cnrs.fr
hal.support@ccsd.cnrs.fr
Logo CCSD