Conference Papers
Year : 2008
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https://hal-emse.ccsd.cnrs.fr/emse-00470515
Submitted on : Tuesday, April 6, 2010-5:24:14 PM
Last modification on : Tuesday, September 17, 2024-3:46:11 PM
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Quentin Mathian, Christelle Kernaflen, Ariane Ferreira, Laurent Bucelle. FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography. 11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France. ⟨emse-00470515⟩
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