FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography - Mines Saint-Étienne Access content directly
Conference Papers Year : 2008

FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography

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emse-00470515 , version 1 (06-04-2010)

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  • HAL Id : emse-00470515 , version 1

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Quentin Mathian, Christelle Kernaflen, Ariane Ferreira, Laurent Bucelle. FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography. 11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France. ⟨emse-00470515⟩
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