FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography

Type de document :
Communication dans un congrès
11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France
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https://hal-emse.ccsd.cnrs.fr/emse-00470515
Contributeur : Sabine Salmeron <>
Soumis le : mardi 6 avril 2010 - 17:24:14
Dernière modification le : mercredi 29 novembre 2017 - 10:07:54

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  • HAL Id : emse-00470515, version 1

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Quentin Mathian, Christelle Kernaflen, Ariane Ferreira, Laurent Bucelle. FDC Pre Alignement & Alignement based on off line data analysis – Concept and industrial application on photolithography. 11th Technical and Scientific Meeting of ARCSIS “Wafer Manufacturing Process Control: methods, applications and new challenges, Nov 2008, Fuveau, France. 〈emse-00470515〉

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