Virtual Metrology Models for Predicting Overlay of Photolithography Process

Ariane Ferreira; Christelle Kernaflen; Laurent Bucelle; Quentin Mathian; Stéphane Decorme

Conference Papers Year : 2010

Virtual Metrology Models for Predicting Overlay of Photolithography Process

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Ariane Ferreira

Function : Author
PersonId : 866542

Département Sciences de la Fabrication et Logistique

Christelle Kernaflen

Function : Author
PersonId : 868620

Département Sciences de la Fabrication et Logistique

Laurent Bucelle

Function : Author

STMicroelectronics [Rousset]

Quentin Mathian

Function : Author

STMicroelectronics [Rousset]

Stéphane Decorme

Function : Author

STMicroelectronics [Rousset]

Keywords

virtual metrology PLS models Photolithography process

Domains

Statistics [math.ST] Statistics Theory [stat.TH]

Ariane Ferreira : Connect in order to contact the contributor

https://hal-emse.ccsd.cnrs.fr/emse-00554221

Submitted on : Monday, January 10, 2011-2:56:49 PM

Last modification on : Tuesday, September 17, 2024-3:45:36 PM

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emse-00554221 , version 1 (10-01-2011)

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HAL Id : emse-00554221 , version 1

Cite

Ariane Ferreira, Christelle Kernaflen, Laurent Bucelle, Quentin Mathian, Stéphane Decorme. Virtual Metrology Models for Predicting Overlay of Photolithography Process. AEC / APC 2010 (11th European Advanced Equipment Control / Advanced Process Control), Apr 2010, catane, Italy. ⟨emse-00554221⟩

Virtual Metrology Models for Predicting Overlay of Photolithography Process

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