Virtual Metrology Models for Predicting Overlay of Photolithography Process - Mines Saint-Étienne Access content directly
Conference Papers Year : 2010
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emse-00554221 , version 1 (10-01-2011)

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  • HAL Id : emse-00554221 , version 1

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Ariane Ferreira, Christelle Kernaflen, Laurent Bucelle, Quentin Mathian, Stéphane Decorme. Virtual Metrology Models for Predicting Overlay of Photolithography Process. AEC / APC 2010 (11th European Advanced Equipment Control / Advanced Process Control), Apr 2010, catane, Italy. ⟨emse-00554221⟩
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