Conference Papers
Year : 2010
Ariane Ferreira : Connect in order to contact the contributor
https://hal-emse.ccsd.cnrs.fr/emse-00554221
Submitted on : Monday, January 10, 2011-2:56:49 PM
Last modification on : Tuesday, September 17, 2024-3:45:36 PM
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- HAL Id : emse-00554221 , version 1
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Ariane Ferreira, Christelle Kernaflen, Laurent Bucelle, Quentin Mathian, Stéphane Decorme. Virtual Metrology Models for Predicting Overlay of Photolithography Process. AEC / APC 2010 (11th European Advanced Equipment Control / Advanced Process Control), Apr 2010, catane, Italy. ⟨emse-00554221⟩
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