Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing - Mines Saint-Étienne Access content directly
Conference Papers Year : 2015
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emse-01792282 , version 1 (15-05-2018)

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Alejandro Sendon, Stéphane Dauzère-Pérès, Jacques Pinaton. Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing. 2015 Winter Simulation Conference (WSC), Dec 2015, Huntington Beach, United States. ⟨10.1109/WSC.2015.7408397⟩. ⟨emse-01792282⟩
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