Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing

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Conference papers
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https://hal-emse.ccsd.cnrs.fr/emse-01792282
Contributor : Stéphane Dauzère-Pérès <>
Submitted on : Tuesday, May 15, 2018 - 12:56:43 PM
Last modification on : Friday, March 15, 2019 - 1:14:52 AM

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Alejandro Sendon, Stéphane Dauzère-Pérès, Jacques Pinaton. Simulation model to control risk levels on process equipment through metrology in semiconductor manufacturing. 2015 Winter Simulation Conference (WSC), Dec 2015, Huntington Beach, United States. ⟨10.1109/WSC.2015.7408397⟩. ⟨emse-01792282⟩

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