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Virtual Metrology Models for Predicting Overlay of Photolithography Process

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https://hal-emse.ccsd.cnrs.fr/emse-00554221
Contributor : Ariane Ferreira <>
Submitted on : Monday, January 10, 2011 - 2:56:49 PM
Last modification on : Wednesday, June 24, 2020 - 4:19:22 PM

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  • HAL Id : emse-00554221, version 1

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Ariane Ferreira, Christelle Kernaflen, Laurent Bucelle, Quentin Mathian, Stéphane Decorme. Virtual Metrology Models for Predicting Overlay of Photolithography Process. AEC / APC 2010 (11th European Advanced Equipment Control / Advanced Process Control), Apr 2010, catane, Italy. ⟨emse-00554221⟩

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